Hale hana a me nā mea hana o Kina Carbon Tetrafluoride

Kiʻi i hōʻike ʻia ʻo Carbon Tetrafluoride

Kāpona Tetrafluoride

Wehewehe Pōkole:

Nā kikoʻī huahana

Nā nīnau i nīnau pinepine ʻia

Nā Lepili Huahana

ʻO Tetrafluoromethane, i ʻike ʻia hoʻi ʻo carbon tetrafluoride, ʻo ia ka fluorocarbon maʻalahi loa (CF4). Loaʻa iā ia ka ikaika hoʻopaʻa kiʻekiʻe loa ma muli o ke ʻano o ka pilina carbon-fluorine. Hiki ke hoʻokaʻawale ʻia he haloalkane a halomethane paha. Ma muli o nā pilina carbon-fluorine he nui, a me ke electronegativity kiʻekiʻe loa o ka fluorine, loaʻa i ke kalapona i loko o ka tetrafluoromethane kahi uku hapa maikaʻi koʻikoʻi e hoʻoikaika a hoʻopōkole i nā pilina carbon-fluorine ʻehā ma ka hāʻawi ʻana i ke ʻano ionic hou aʻe. He kinoea ʻōmaʻomaʻo ikaika ʻo Tetrafluoromethane.

I kekahi manawa hoʻohana ʻia ʻo Tetrafluoromethane ma ke ʻano he refrigerant haʻahaʻa haʻahaʻa. Hoʻohana wale ʻia ia i ka hana microfabrication uila a i ʻole i hui pū ʻia me ka oxygen ma ke ʻano he plasma etchant no ka silicon, silicon dioxide, a me ka silicon nitride.

ʻO ke ʻano kemika	CF4	Kaumaha molekole	88
Helu CAS.	75-73-0	Helu EINECS.	200-896-5
Kiko heheʻe	-184℃	kiko paila	-128.1℃
ka hiki ke hoʻoheheʻe ʻia	ʻAʻole hoʻoheheʻe ʻia i ka wai	Ka nui o ka paʻa	1.96g/cm³（-184℃）
helehelena	He kinoea ʻaʻohe kala, ʻaʻohe ala, ʻaʻole hiki ke lapalapa, a hiki ke hoʻopili ʻia	Noi	hoʻohana ʻia i ke kaʻina hana etching plasma no nā kaapuni hoʻohui like ʻole, a hoʻohana ʻia hoʻi e like me ke kinoea laser, refrigerant etc.
Helu ID DOT	UN1982	INOA HOʻOUNA DOT/IMO:	Tetrafluoromethane, Kinoea i hoʻopaʻa ʻia a i ʻole Refrigerant R14
		Papa Pōʻino DOT	Papa 2.2

Mea	Waiwai, papa I	Waiwai, papa II	ʻĀpana
Maʻemaʻe	≥99.999	≥99.9997	%
O₂	≤1.0	≤0.5	ppmv
N₂	≤4.0	≤1.0	ppmv
CO	≤0.1	≤0.1	ppmv
CO₂	≤1.0	≤0.5	ppmv
SF₆	≤0.8	≤0.2	ppmv
Nā fluorocarbons ʻē aʻe	≤1.0	≤0.5	ppmv
H₂O	≤1.0	≤0.5	ppmv
H₂	≤1.0	——	ppmv
ʻakika	≤0.1	≤0.1	ppmv
*ʻo nā fluorocarbons ʻē aʻe e pili ana iā C₂F₆ʻO C₃F₈