
Tetrafluoromethane, inozivikanwawo secarbon tetrafluoride, ndiyo fluorocarbon iri nyore (CF4). Ine simba guru rekubatana nekuda kwehunhu hwecarbon-fluorine bond. Inogonawo kuverengerwa sehaloalkane kana halomethane. Nekuda kwezvisungo zvakawanda zvecarbon-fluorine, uye electronegativity yepamusoro yefluorine, kabhoni iri mutetrafluoromethane ine charge huru yechikamu iyo inosimbisa nekupfupisa zvisungo zvina zvecarbon-fluorine nekupa imwe ionic character. Tetrafluoromethane igesi ine simba regreenhouse.
Dzimwe nguva tetrafluoromethane inoshandiswa semuchina wekuisa mufiriji usingadhuri. Inoshandiswa mukugadzirwa kwemagetsi chete kana pamwe chete neokisijeni sechikamu cheplasma chesilicon, silicon dioxide, uye silicon nitride.
| Fomura yemakemikari | CF4 | Kurema kwemasero | 88 |
| Nhamba yeCAS | 75-73-0 | Nhamba yeEINECS | 200-896-5 |
| Nzvimbo yekunyunguduka | -184℃ | Poindi yekubhowa | -128.1℃ |
| kunyungudika | Hazvinyunguduke mumvura | Kuwanda kwevanhu | 1.96g/cm³(-184℃) |
| Chitarisiko | Gasi risina ruvara, risina hwema, risingatsvi, uye rinodzvanywa | Kushandiswa | inoshandiswa mukuita plasma etching process yezvikamu zvakasiyana-siyana zvakabatanidzwa, uye inoshandiswawo se laser gas, refrigerant nezvimwewo. |
| Nhamba yeID yeDOT | UN1982 | Zita rekutumira: DOT/IMO | Tetrafluoromethane, Gasi Rakamanikidzwa kana Refrigerant R14 |
| Kirasi yeNjodzi yeDOT | Kirasi 2.2 |
| Chinhu | Kukosha, giredhi I | Kukosha, giredhi rechipiri | Chikamu |
| Kuchena | ≥99.999 | ≥99.9997 | % |
| O2 | ≤1.0 | ≤0.5 | ppmv |
| N2 | ≤4.0 | ≤1.0 | ppmv |
| CO | ≤0.1 | ≤0.1 | ppmv |
| CO2 | ≤1.0 | ≤0.5 | ppmv |
| SF6 | ≤0.8 | ≤0.2 | ppmv |
| Mamwe ma fluorocarbon | ≤1.0 | ≤0.5 | ppmv |
| H2O | ≤1.0 | ≤0.5 | ppmv |
| H2 | ≤1.0 | —— | ppmv |
| Acidity | ≤0.1 | ≤0.1 | ppmv |
| *mamwe ma fluorocarbon anoreva C2F6、C3F8 | |||
Zvinyorwa
1) ruzivo rwese rwehunyanzvi rwataurwa pamusoro apa nderwekushandisa ruzivo rwako.
2) mamwe matsanangudzo anogamuchirwa kuti tikurukure zvakadzama.